Chinese Journal of Synthetic Chemistry  2023, Vol. 31 Issue (8): 610-616 DOI: 10.15952/j.cnki.cjsc.1005-1511.23036 |
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| Preparation and Properties of Heterocyclic Zinc-based Photoresist | |||
| WU Rong1,3, ZHAO Weizhen2*, WANG Gongying3 | |||
| 1. Chengdu Institute of Organic Chemistry, Chinese Academy of Sciences, Chengdu 610041, China; 2. Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China; 3 University of Chinese Academy of Sciences, Beijing 100049, China | |||
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